Cleaning method, device manufacturing method, cleaning substrate, liquid immersion member, liquid immersion exposure apparatus, and dummy substrate

A cleaning substrate that is used for cleaning a liquid immersion member which has an opening through which exposure light irradiating a substrate passes and a liquid recovery port which is disposed in at least a part of the periphery of the opening, and holds a first liquid between the liquid immersion member and the substrate so that at least a part of an optical path of the exposure light is filled with the first liquid, in a liquid immersion exposure apparatus, the cleaning substrate comprising:

• a first portion which is liquid-repellent to a second liquid for cleaning;
• and
• a second portion which is disposed in at least a part of the periphery of the first portion and is more lyophilic to the second liquid than the first portion,
• wherein when the cleaning substrate is disposed to face the liquid immersion member so as to clean the liquid immersion member with the second liquid, the first portion suppresses the second liquid supplied between the liquid immersion member and the second portion from passing through the opening.

A liquid immersion member that is used in a liquid immersion exposure apparatus which exposes a substrate with exposure light through a first liquid, and holds the first liquid between the liquid immersion member and the substrate so that at least a part of an optical path of the exposure light is filled with the first liquid, the liquid immersion member comprising:

• an opening through which the exposure light passes;
• a liquid recovery port which is disposed in at least a part of the periphery of the opening;
• and
• a supply port which is disposed outside of the liquid recovery port with reference to the opening and through which a second liquid for cleaning is supplied.