Methods and apparatus for an induction coil arrangement in a plasma processing system
OwnerNeil Martin Paul Benjamininventor
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Abstract
An antenna arrangement in a plasma processing system for providing plasma uniformity across a substrate during substrate processing is provided. The arrangement includes a plurality of circular antenna assemblies. Each circular antenna assembly of the plurality of circular antenna assemblies includes a set of non-circular coils. Each non-circular coil of the set of non-circular coils is offset at a predetermined angle in an azimuthal direction. The arrangement also includes a set of power generators for powering the plurality of circular antenna assemblies.
Claims20
An antenna arrangement in a plasma processing system for providing plasma uniformity across a substrate during substrate processing, comprising:
- a plurality of circular antenna assemblies, wherein each circular antenna assembly of said plurality of circular antenna assemblies includes a set of non-circular coils, wherein each non-circular coil of said set of non-circular coils is offset at a predetermined angle in an azimuthal direction;
- and
- a set of power generators for powering said plurality of circular antenna assemblies.
Dependencies are inferred from the claim text.