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US 2011/0084417 A1Published application
Large area linear array nanoimprinting
AssigneeMolecular Imprints, Inc.
InventorsByung-Jin Choi, Sidlgata V. Sreenivasan, Anshuman Cherala
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Abstract
Systems and methods for imprinting and aligning an imprint lithography template with a field on a substrate are described. The field of the substrate may include an elongated side, and alignment sensitivity on the elongated side may be intentionally minimized.
Claims20
A method, comprising:
- aligning an imprint lithography template with a field on a substrate, the field of the substrate having a first side with a first dimension and a second side with a second dimension, the first dimension being substantially greater than the second dimension, wherein alignment sensitivity of the first side is substantially lower than the second side.
Dependencies are inferred from the claim text.