Pattern formation method
OwnerShinichi ITOinventor
Life of this patent
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Abstract
A pattern formation method, includes: bringing a template into contact with a photo-curable agent to fill the photo-curable agent into a concave pattern formed on the template; forming a hydrophilizing component in the photo-curable agent to hydrophilize the photo-curable agent; irradiating the filled photo-curable agent with a first light to cure the photo-curable agent; irradiating the photo-curable agent including the hydrophilizing component with a second light after irradiating with the first light to cause a reaction of the photo-curable agent at an interface of the template; and demolding the template from the photo-curable agent to form a photo-curable agent pattern.
Claims15
A pattern formation method, comprising:
- bringing a template into contact with a photo-curable agent to fill the photo-curable agent into a concave pattern formed on the template;
- forming a hydrophilizing component to an interface between the photo-curable agent and a surface of the template;
- irradiating the filled photo-curable agent with a first light to cure the photo-curable agent;
- irradiating the photo-curable agent including the hydrophilizing component with a second light after irradiating with the first light to cause a reaction of the photo-curable agent at an interface of the template;
- and
- demolding the template from the photo-curable agent to form a photo-curable agent pattern.
Dependencies are inferred from the claim text.