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US 2010/0245790 A1Published application
Method and system for detecting particle contamination in an immersion lithography tool
AssigneeGlobalfoundries Inc.
InventorsRolf Seltmann, Rene Wirtz
Life of this patent
Estimating the term…
Abstract
In an immersion lithography tool, the status of the immersion hood surface may be estimated on the basis of an inline detection system that generates optical measurement data. For example, a digital imaging system may be implemented in order to obtain optical measurement data without requiring exposure of the interior of the lithography tool to ambient air. In other cases, other optical measurement techniques, such as FTIR and the like, may be applied.
Claims20
An immersion lithography system, comprising:
- an imaging system having a radiation output configured to expose a defined field on a surface of a substrate with a radiation pattern;
- a substrate holder configured to receive said substrate and align said substrate relative to said radiation output;
- an immersion hood configured to provide an immersion medium in contact with at least a portion of said surface, said immersion hood having a hood surface facing said substrate;
- and
- an optical detection system configured to obtain optical measurement data at least from a portion of said hood surface.
2 more elements
A method of operating an immersion lithography system, the method comprising:
- obtaining optical measurement data from a surface of an immersion hood;
- determining a surface state of said surface on the basis of said optical measurement data;
- and
- controlling operation of said immersion lithography system on the basis of said surface state.
1 more element
A method, comprising:
- exposing a reflecting test area of a test substrate in an immersion lithography system so as to reflect a portion of an exposure radiation onto an immersion hood surface, said test substrate further comprising a detection area comprising a radiation sensitive material;
- and
- determining a status of said hood surface on the basis of a latent image formed in said radiation sensitive material.
Dependencies are inferred from the claim text.