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AssigneeCadence Design Systems, Inc.
InventorZhenhai Zhu
Estimating the term…
Disclosed are improved methods, systems, and computer program products for lithographic simulation of an electronic circuit design. Various embodiments of the present invention identifies a mask pattern, performs offline precharacterization for the mask pattern by solving an equation which models a solution for the mask pattern and an interaction between the mask pattern and one or more effects, performs online evaluation based at least upon a parameterized form of the equation, determines a field around the mask pattern based at least upon the act of performing the online evaluation, and stores a result of the act of determining an electromagnetic field around the mask pattern in a tangible computer readable or usable medium
A machine-implemented method for lithographic simulation of an electronic circuit design, the method comprising:
A system for lithographic simulation of an electronic circuit design, the system comprising:
A computer program product comprising a computer-usable storage medium having executable code to execute a process for lithographic simulation of an electronic circuit design, the process comprising:
Dependencies are inferred from the claim text.