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US 2010/0167212 A1Published application
Resist underlayer composition and method of manufacturing integrated circuit device using the same
OwnerHyeon-Mo Cho, Sang-Kyun Kim +6inventors
InventorsHyeon-Mo Cho, Sang-Kyun Kim, Mi-Young Kim, Sang-Ran Koh, Hui-Chang Yun, Yong-Jin Chung, Jong-Seob Kim, In-Sun Jung
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