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AssigneeHoya Corporation
InventorsToshiyuki SUZUKI, Masahiro HASHIMOTO, Kazunori ONO, Ryo OHKUBO, Kazuya SAKAI
Estimating the term…
A thin film made of a material containing a metal and silicon is formed on a light-transmissive substrate. Then, a treatment is performed to modify a main surface of the thin film in advance so that when exposure light having a wavelength of 200 nm or less is accumulatively irradiated on a thin film pattern of a photomask to be produced by patterning the thin film, the transfer characteristic of the thin film pattern does not change more than a predetermined degree. This treatment is performed by carrying out, for example, a heat treatment in an atmosphere containing oxygen at 450° C. to 900° C.
A method of manufacturing a photomask blank having, on a light-transmissive substrate, a thin film for forming a transfer pattern, said method comprising:
A method of manufacturing a photomask blank having, on a light-transmissive substrate, a thin film for forming a transfer pattern, said method comprising:
Dependencies are inferred from the claim text.