Lithographic apparatus and device manufacturing method

A device manufacturing method comprising projecting a patterned beam of radiation using a projection system onto the substrate through a liquid, wherein liquid leaks from a space between the projection system and the substrate to cover the substrate and the liquid comprises an additive for lowering the contact angle of the liquid on the substrate.

A device manufacturing method comprising projecting a patterned beam of radiation onto a substrate through a liquid wherein the liquid is supplied by a liquid supply system and any liquid escaping from the liquid supply system is removed by a liquid removal system which surrounds the liquid supply system and moves relative to the liquid supply system.

-34. (canceled)