Resin composition, resin spacer film, and semiconductor device
AssigneeSumitomo Bakelite Co., Ltd.
InventorsToyosei Takahashi, Rie Takayama
Life of this patent
Estimating the term…
Loading patent…
AssigneeSumitomo Bakelite Co., Ltd.
InventorsToyosei Takahashi, Rie Takayama
Estimating the term…
The present invention provides a resin composition. The resin composition is used for a resin spacer provided in a semiconductor device. The semiconductor device comprises of a substrate, a semiconductor element mounted on an interposer so as to face the substrate, and the resin spacer provided between the substrate and the interposer or the semiconductor element for bonding them together in a state that a space is formed between the substrate and the semiconductor element. The resin composition comprises an alkali solubility resin, a photopolimerization resin, and a particulate filler. An average particle size of the particulate filler is in the range of 0.05 to 0.35 μm. An amount of the particulate filler contained in the resin composition is in the range of 1 to 40 wt %. Further, the present invention also provides a resin spacer film. The resin spacer film is constituted of the resin composition described above.
A resin composition to be used for a resin spacer provided in a semiconductor device, the semiconductor device comprising a substrate, a semiconductor element mounted on an interposer so as to face the substrate, and the resin spacer provided between the substrate and the interposer or the semiconductor element for bonding them together in a state that a space is formed between the substrate and the semiconductor element, wherein the resin composition comprising:
Dependencies are inferred from the claim text.