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US 2010/0163958 A1Published application
Single-poly eeprom cell and method for fabricating the same
OwnerJong-Keon Choiinventor
Life of this patent
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Abstract
A single-poly EEPROM cell and a method for fabricating the same include a single floating gate formed in a single body; first and second read transistors sharing the single floating gate; and a control gate spaced apart from the first and second read transistors and overlapped with the floating gate. In the single-poly EEPROM structure, as a tunneling region is removed and a read PTR is additionally formed, a read margin can be enhanced without increase of overall area.
Claims20
An apparatus comprising:
- a floating gate formed in a single body;
- first and second read transistors electronically connected to the floating gate;
- and
- a control gate spaced apart from the first and second read transistors and overlapped with the floating gate.
1 more element
A method comprising:
- forming a deep N well region in a P type semiconductor substrate;
- forming a control gate spaced apart from the N well region;
- forming first and second read transistors in the deep N well region;
- and then
- forming a floating gate connected with the first and second read transistors.
2 more elements
An apparatus comprising:
- a substrate;
- a floating gate formed over the substrate, the floating gate having a main floating gate portion, a first floating gate portion extending from the main floating gate portion and a second floating gate portion extending from the main floating gate portion in a direction parallel to the first floating gate portion;
- a first transistors electronically connected to the floating gate by way of the first floating gate body;
- first and second read transistors electronically connected to the floating gate by way of the first floating gate body;
- and
- a control gate spaced apart from the first transistor and the second transistor and overlapped with the floating gate.
3 more elements
Dependencies are inferred from the claim text.