Vacuum processing apparatus
OwnerMichiaki Kobayashi, Tsutomu Nakamura +2inventors
InventorsMichiaki Kobayashi, Tsutomu Nakamura, Koji Okuda, Masakazu Isozaki
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Abstract
A vacuum processing apparatus which includes a vacuum vessel having a processing chamber provided therein into which a processing gas is supplied to form a plasma and which processes a wafer located in the processing chamber, and a vacuum transfer vessel having a vacuumed transfer chamber coupled with the vacuum vessel provided therein into which the wafer is transferred. A resin-made film having a plasma resistance is bonded onto a surface of a lid of the vacuum transfer vessel on the side of the transfer chamber.
Claims7
A vacuum processing apparatus comprising:
- a vacuum vessel having a processing chamber provided therein into which a processing gas is supplied to form a plasma and which processes a wafer located in the processing chamber;
- and
- a vacuum transfer vessel having a vacuumed transfer chamber coupled with the vacuum vessel provided therein into which the wafer is transferred;
- wherein a resin-made film having a plasma resistance is bonded onto a surface of a lid of the vacuum transfer vessel on the side of the transfer chamber.
Dependencies are inferred from the claim text.