Container for precursors used in deposition processes
AssigneeLinde Aktiengesellschaft
InventorCe MA
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Abstract
Precursor source containers to hold precursor materials used in thin film deposition processes, such as ALD and MOCVD methods are described. In particular, the container holds both a liquid precursor or a dissolved precursor solution and a rinse solvent in separate chambers, and reduces the overall space requirement. In one embodiment, a cylinder within a cylinder arrangement provides two separate chambers, one for the precursor solution and the other for the rinse solvent.
Claims9
A container for use in a deposition process, the container comprising two separate chambers, wherein a first chamber is configured to hold liquid precursor solution and a second container is configured to hold rinse solution.
Dependencies are inferred from the claim text.