Apparatus with strain release feature for high temperature processes
AssigneeApplied Materials, Inc.
InventorMICHAEL TSENG
Life of this patent
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Abstract
A method and apparatus for thermally treating a substrate is provided. A thermal treatment chamber has a substrate support and a magnetically permeable rotor housed in a rotor well. An annular cover shields the rotor from the processing environment. The annular cover has a thermal stress relief joint formed therein that provides one or more mechanical degrees of freedom to allow portions of the cover to shift with thermal stresses. In one embodiment, a gap is formed in the annular cover at the point of maximum thermal stress.
Claims20
A rotor cover for a thermal treatment chamber, comprising:
- an annulus having an inner portion and an outer portion;
- a support ledge formed in the outer portion of the annulus;
- a shield portion formed in the inner portion of the annulus;
- and
- a gap in the annulus.
An apparatus for thermally treating a substrate, comprising:
- a substrate support;
- a magnetically permeable ring below the substrate support;
- and
- an annular cover over the magnetically permeable ring, wherein the annular cover has a gap.
A shield member for a thermal treatment chamber, comprising a ceramic ring-like article with a support ledge formed in an outer portion, a shield extension formed in an inner portion, and a gap, wherein the gap is a vertical opening in a portion of the ceramic ring-like article comprising an open space measuring less than about 0.05 inches between two portions of the ceramic ring-like article.
Dependencies are inferred from the claim text.