Lithographic apparatus and device manufacturing method

A lithographic apparatus comprising:

• a substrate table configured to hold a substrate;
• a projection system configured to project a patterned beam of radiation onto a target portion of the substrate;
• and
• a liquid supply system configured to at least partially fill a space between the projection system and the substrate table, with a liquid,
• wherein a joint between an element of the projection system and its support comprises (i) an inorganic layer and glue protection, or (ii) a direct bond by which molecules of the element and its support chemically interact, or (iii) both (i) and (ii), and the joint is contacted by liquid when liquid is supplied by the liquid supply system to the space between the projection system and the substrate table.