Thin film deposition apparatus and method thereof

A deposition apparatus comprising:

• a substrate support configured to support a substrate;
• and
• a substrate mounting error detector comprising:
• a light source configured to generate a light beam directed to the substrate support;
• a collimator including one or more openings that are configured to selectively pass particularly oriented and directed portions of the light beam as reflected from the substrate or the substrate support;
• and
• an optical sensor configured to detect the portions of the light beam passed by the collimator.

A method of depositing a thin film, the method comprising:

• loading a substrate onto a substrate support within a chamber;
• providing a light beam onto the substrate such that the light beam is reflected by the substrate;
• passing at least a portion of the reflected light beam when the substrate is positioned at a correct location of the substrate support while blocking the entire portion of the light beam when the substrate is positioned at an incorrect location of the substrate support;
• and
• detecting the at least a portion of the light beam.