Semiconductor device and method of fabricating the same

A semiconductor device comprising:

• a semiconductor substrate in which a cell region is defined;
• a plurality of lower electrodes formed above the cell region, wherein the plurality of lower electrodes are arranged in an array including a plurality of rows extending substantially parallel to one another along a first direction;
• a stripe-shaped capacitor support pad interposed between a pair of adjacent ones of the plurality of rows and connected to lower electrodes in the pair of adjacent ones of the plurality of rows;
• and
• a plurality of capacitors, wherein each of the plurality of capacitors includes a corresponding one of the plurality of lower electrodes, a dielectric film, and an upper electrode,
• wherein an upper end of the capacitor support pad is below the upper ends of the lower electrodes, and
• wherein a portion of the stripe-shaped capacitor support pad is interposed between adjacent ones of lower electrodes included within at least one of the plurality of rows and is connected to the adjacent ones of lower electrodes included within the at least one of the plurality of rows.