Ic layout parsing for multiple masks

A method of preparing layout data with a computer to create two or more mask layouts that produce a target pattern of features with a photolithographic process, comprising:

• receiving a target layout or portion thereof into a memory of the computer that defines a number of features to be created with the photolithographic process;
• searching the target layout received for features having a predefined shape;
• introducing at least one cut point at a predefined location of features that have the predefined shape to create separate sub-features;
• and
• providing the features and sub-features to a coloring algorithm that divides the features and the sub-features of the target layout between the two or more mask layouts such that no feature on the mask layouts is spaced less than a predetermined distance from an adjacent feature of the mask layout.