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US 2008/0305441 A1Published application
Hardmask composition having antirelective properties and method of patterning material on susbstrate using the same
AssigneeCheil Industries Inc.
InventorsKyong Ho YOON, Jong Seob KIM, Dong Seon UH, Hwan Sung CHEON, Chang Il OH, Min Soo KIM, Jin Kuk LEE
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Abstract
A hardmask composition includes an organic solvent and one or more aromatic ring-containing polymers represented by Formulae 1, 2 and 3:
Claims12
A hardmask composition, comprising:
- (a) an organic solvent;
- and
- (b) one or more aromatic ring-containing polymers represented by Formulae 1, 2 and 3:
- Formula 1:
- wherein each R1 in Formula 1 is selected from:
- where, in R1, R is H or alkyl,
- wherein each R2 in Formula 1 is selected from:
- hydrogen, hydroxyl, C1-C10 alkyl, C6-C10 aryl, allyl, and halogen,
- wherein R3 in Formula 1 is selected from:
- wherein n in Formula 1 satisfies 1≦n≦750;
- Formula 2:
- wherein R4 in Formula 2 is selected from:
- where, in
- R4, R is H or alkyl,
- R5 in Formula 2 is selected from:
- n in Formula 2 satisfies 1≦n≦750;
- and
- Formula 3:
- wherein R1, R2, R3, R4, R5 and n in Formula 3 are the same as in Formulae 1 and 2, and
- wherein m in Formula 3 satisfies 1≦m≦750 and 2≦(m+n)<1,500.
17 more elements
Dependencies are inferred from the claim text.