Immersion exposure technique
AssigneeCanon Kabushiki Kaisha
InventorHitoshi Nakano
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Abstract
It is an object of this invention to provide an exposure technique which uses immersion method and is highly practical. For example, an exposure apparatus includes a substrate stage which holds and moves a substrate, and a supply unit which has a supply nozzle and supplies a liquid to the surface of the substrate. The opening of the supply nozzle is arranged at a side of a projection optical system so as to oppose the substrate, and the supply unit supplies the liquid in accordance with movement of the substrate by the substrate stage.
Claims2
An exposure apparatus which exposes a substrate to a pattern through a projection optical system, said apparatus comprising:
- a substrate stage which holds and moves the substrate;
- and
- a supply unit which has a supply nozzle and supplies a liquid to a surface of the substrate,
- wherein an opening of said supply nozzle is arranged at a side of said projection optical system so as to oppose the substrate, and
- said supply unit supplies the liquid in accordance with movement of the substrate by said substrate stage.
2-44. (canceled)
Dependencies are inferred from the claim text.