Lithographic apparatus and device manufacturing method

A lithographic apparatus, comprising:

• a substrate table constructed to hold a substrate to be exposed;
• a projection system configured to project a patterned radiation beam onto a target portion on a side of the substrate to be exposed;
• a liquid supply system configured to at least partly fill a region between the substrate and the projection system with a liquid;
• and
• a liquid confinement structure fixed in a plane substantially perpendicular to an optical axis of the projection system and configured to cooperate with the substrate table in order to restrict the liquid to a region above an upper surface of the substrate table so that a side of the substrate to be exposed is substantially covered in the liquid during exposure.