Semiconductor electrically programmable fuse element with amorphous silicon layer after programming and method of programming the same
AssigneeKabushiki Kaisha Toshiba
InventorsNobuaki Otsuka, Takahiko Sasaki, Shuso Fujii
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Abstract
A fuse link is formed between first and second terminals. The first and second terminals and fuse link have a polysilicon layer and a layer formed on the polysilicon layer and containing a metal element. At least a portion of the fuse link is an amorphous silicon layer.
Claims7
A method of programming a semiconductor device, in which supplying an electric current to a fuse link via first and second terminals, said fuse link formed between the first and second terminals, the first and second terminals and fuse link having a polysilicon layer and a layer formed on the polysilicon layer and containing a metal element;
- and
- fusing the polysilicon layer in at least a portion of the fuse link by means of heat generated by the electric current, and localizing the metal element to a portion of the fused polysilicon layer, which is near the first terminal.
Dependencies are inferred from the claim text.