Electromigration Aggravated Electrical Fuse Structure

A fuse structure for being used in electromigration (EM) programming modes, the fuse structure comprising:

• an anode area overlaying a first plurality of contacts that are coupled to a positively high voltage during a programming of the fuse structure;
• a cathode area overlaying a second plurality of contacts that are coupled to a complementary low voltage during a programming of the fuse structure;
• and
• a fuse link area having a first end and a second end and having a stacked first and second layer,
• wherein the first layer is subject to EM effect and the second layer contains a reverse biased PN junction during the programming,
• wherein the first end contacts the anode area at a predetermined distance to the nearest of the first plurality of contacts, and the second end contacts the cathode area at the predetermined distance to the nearest of the second plurality of contacts,
• wherein a width of the fuse link area at the first end and the second end is equal to a width of the anode area and the cathode area for aggravating the electromigration effect at the contacts.

A fuse structure for being used in electromigration programming modes, the fuse structure comprising:

• an anode area overlaying a first plurality of contacts that are coupled to a positively high voltage during a programming of the fuse structure;
• a cathode area overlaying a second plurality of contacts that are coupled to a complementary low voltage during a programming of the fuse structure, wherein the cathode area overlays the second plurality of contacts by a distance smaller than specified by a predetermined design rule;
• and
• a fuse link area having a first end and a second end,
• wherein the first end contacts the anode area at a predetermined distance to the nearest of the first plurality of contacts, and the second end contacts the cathode area at the predetermined distance to the nearest of the second plurality of contacts,
• wherein a width of the fuse link area at the first end and the second end is equal to a width of the anode area and the cathode area for aggravating the electromigration effect at the contacts.