Exposure apparatus

A device manufacturing method utilizing an exposure apparatus for exposing a plurality of shot areas on a substrate to light through a liquid, the apparatus including,

• a movable stage including a chuck configured to hold the substrate and a plate arranged around of the chuck;
• a projection optical system configured to project a light through an original onto the substrate held by the chuck;
• a first liquid supply nozzle arranged along a periphery of a final optical element of the projection optical system;
• and
• a plurality of second liquid supply nozzles arranged on the stage;
• wherein the exposure apparatus supplies the liquid to a gap between the final optical element and the substrate through the first liquid supply nozzle;
• and
• wherein the exposure apparatus selects a nozzle for supplying the liquid from among the plurality of the second liquid supply nozzles based on a location of an exposure shot area on the substrate and supplies the liquid to a gap between the chuck and the plate using the selected second liquid supply nozzle;
• the method including:
• exposing a substrate to light using the exposure apparatus;
• and developing the substrate exposed to light.

An exposure apparatus for exposing a plurality of shot areas on a substrate to light through a liquid, the apparatus comprising:

• a movable stage including a chuck configured to hold the substrate and a plate arranged around of the chuck;
• a projection optical system configured to project a light through an original onto the substrate held by the chuck;
• a first liquid supply nozzle arranged along a periphery of a final optical element of the projection optical system;
• and
• a plurality of second liquid supply nozzles arranged on the stage;
• wherein the exposure apparatus supplies the liquid to a gap between the final optical element and the substrate through the first liquid supply nozzle;
• and
• wherein the exposure apparatus selects a nozzle for supplying the liquid from among the plurality of the second liquid supply nozzles based on a location of an exposure shot area on the substrate and a drive condition of the stage and supplies the liquid to a gap between the chuck and the plate using the selected second liquid supply nozzle.