US 2008/0187859 A1 · Radiation-Sensitive Resin Composition

Abstract

A radiation-sensitive resin composition exhibiting only extremely controlled change in the sensitivity after storage when used as a chemically-amplified resist possessing high transparency at a wavelength of 193 nm or less and particularly excellent depth of focus (DOF) is provided. The radiation-sensitive resin composition comprises (A) a siloxane resin having a structural unit (I) shown by the following formula (I) and/or a structural unit (II) shown by the following formula (II), (B) a photoacid generator, and (C) a solvent, the content of nitrogen-containing compounds in the composition being not more than 100 ppm, wherein A and B individually represent a substituted or unsubstituted divalent linear, branched, or cyclic hydrocarbon group, R1 represents a monovalent acid-dissociable group, and R2 represents a hydrogen atom or monovalent acid-dissociable group.

Claims20

Dependent claims

A radiation-sensitive resin composition comprising (A) a siloxane resin having a structural unit (I) shown by the following formula (I) and/or a structural unit (II) shown by the following formula (II), (B) a photoacid generator, and (C) a solvent, the content of nitrogen-containing compounds other than the components (A) to (C) in the composition being not more than 100 ppm,

wherein A represents a substituted or unsubstituted divalent linear, branched, or cyclic hydrocarbon group having 1 to 20 carbon atoms, R1 represents a monovalent acid-dissociable group, B represents a substituted or unsubstituted divalent linear, branched, or cyclic hydrocarbon group having 1 to 20 carbon atoms, and R2 represents a hydrogen atom or a monovalent acid-dissociable group.

A radiation-sensitive resin composition comprising (A) a siloxane resin having a structural unit (I) shown by the following formula (I) and/or a structural unit (II) shown by the following formula (II) and a structural unit (III) shown by the following formula (III), (B) a photoacid generator, and (C) a solvent, the content of nitrogen-containing compounds other than the components (A) to (C) in the composition being not more than 100 ppm,

wherein A represents a substituted or unsubstituted divalent linear, branched, or cyclic hydrocarbon group having 1 to 20 carbon atoms, R1 represents a monovalent acid-dissociable group, and B represents a substituted or unsubstituted divalent linear, branched, or cyclic hydrocarbon group having 1 to 20 carbon atoms, and R2 represents a hydrogen atom or a monovalent acid-dissociable group, and
wherein R7 represents a substituted or unsubstituted monovalent hydrocarbon group having 1 to 20 carbon atoms or a substituted or unsubstituted monovalent heterocyclic group having 3 to 20 atoms.

Dependencies are inferred from the claim text.

Radiation-Sensitive Resin Composition

Life of this patent

Radiation-Sensitive Resin Composition

Life of this patent

Abstract

Claims20