Coupling apparatus, exposure apparatus, and device fabricating method

A lithographic projection apparatus comprising:

• an illumination system arranged to condition a radiation beam;
• a support structure that holds a patterning device, the patterning device being capable of imparting the radiation beam with a pattern;
• a substrate table that holds a substrate;
• a projection system arranged to project the patterned radiation beam onto a target portion of the substrate, the projection system comprising two separate physical parts that are decoupled, wherein each part comprises an optical element of the projection system;
• and
• a liquid supply system that at least partly fills a space between the projection system and the substrate, with a liquid,
• wherein the substrate table is movable with respect to the projection system while at least part of the space between the projection system and substrate is filled with the liquid.

An apparatus capable of projecting light comprising:

• a frame;
• a lens system disposed within said frame;
• a horizontal support surface generally associated with said frame capable of holding a semiconductor wafer;
• a final lens element in said lens system, positioned near a first end of said frame, said final lens element having a final lens element surface, said final lens element surface capable of being positioned near said semiconductor wafer;
• and
• a light source positioned near a second end of said frame, said light source capable of passing light through said lens system;
• wherein said final lens element is capable of movement relative to said frame.