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US 2008/0186461 A1Published application
Liquid sealing unit and immersion photolithography apparatus having the same
AssigneeSamsung Electronics Co., Ltd.
InventorIn-Seop Shin
Life of this patent
Estimating the term…
Abstract
A liquid sealing unit is provided. The liquid sealing unit includes a storage vessel for containing a liquid and having an optical nozzle hole through which light can be transmitted, and a sealing part for containing a fluid in contact with the liquid contained in the optical nozzle hole. An immersion photolithography apparatus having the liquid sealing unit is also provided. Therefore, it is possible to substantially prevent contamination of an immersion projection optical system.
Claims20
A liquid sealing unit comprising:
- a storage vessel configured to contain a liquid and having an optical nozzle hole formed therein configured to enable light transmission therethrough;
- and
- a sealing part configured to contain a fluid in contact with the liquid contained in the optical nozzle hole.
An immersion photolithography apparatus having a liquid sealing unit, comprising:
- a storage vessel configured to contain a liquid and having an optical nozzle hole formed therein configured to enable light transmission therethrough;
- a wafer stage configured to receive a wafer, the wafer stage movable to a lower part of the storage vessel;
- a sealing part configured to contain a fluid in contact with the liquid contained in the optical nozzle hole under the storage vessel;
- and
- a moving part configured to move the sealing part to the lower part of the storage vessel.
2 more elements
Dependencies are inferred from the claim text.