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US 2008/0186459 A1Published application
Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsHelmar Van Santen, Aleksey Kolesnychenko
Life of this patent
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Abstract
A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.
Claims21
-37. (canceled)
A lithographic apparatus comprising:
- a substrate table configured to hold an object;
- a projection system configured to project a patterned beam onto a target portion of an object;
- a structure disposed adjacent a final element of the projection system and the substrate table, the structure configured to supply immersion liquid, at least part of a surface of the structure defining with the projection system and the substrate table and/or the object a space configured to at least partially confine the immersion liquid, the structure being controllably positioned relative to the object such that the immersion liquid may leak between the object and/or substrate table and a bottom surface of the structure such that the immersion liquid reaches an edge of the substrate table;
- and
- an outlet radially outward of the structure, the outlet configured to remove the immersion liquid.
2 more elements
A lithographic apparatus comprising:
- a support structure configured to hold a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned beam onto a target portion of the substrate;
- and
- a liquid supply system configured to provide a liquid to a space between the substrate and the projection system, the liquid supply system comprising a liquid inlet provided on a boundary of the space, not provided on the substrate table, and mechanically isolated from the projection system,
- wherein, in use, the liquid is not substantially confined in the space so that liquid can flow out of the space.
3 more elements
A lithographic apparatus comprising:
- a support structure configured to hold a patterning device, the patterning device configured to impart the beam with a pattern in its cross-section;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned beam onto a target portion of the substrate;
- an inlet to provide a liquid to a space between the substrate and the projection system, the liquid inlet not provided on the substrate table;
- and
- an outlet to receive liquid, the liquid outlet located radially outwardly, relative to an optical axis of the projection system during projection of the patterned beam, of the liquid inlet and of a periphery of the substrate when the substrate is held by the substrate table,
- wherein, during projection of the patterned beam, liquid flows outwardly from the liquid inlet into the liquid outlet.
4 more elements
Dependencies are inferred from the claim text.