Antireflective coating compositions
AssigneeAZ Electronic Materials USA Corp.
InventorsDavid J. Abdallah, Ralph R. Dammel
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Abstract
The present invention relates to a spin-on antireflective coating composition for a photoresist comprising a polymer, a crosslinking compound and a thermal acid generator, where the polymer comprises at least one functional moiety capable of increasing the refractive index of the antireflective coating composition to a value equal or greater than 1.8 at exposure radiation used for imaging the photoresist and a functional moiety capable of absorbing exposure radiation used for imaging the photoresist. The invention further relates to a process for imaging the antireflective coating of the present invention.
Claims26
A spin-on antireflective coating composition for a photoresist comprising a polymer, and a thermal acid generator, where the polymer comprises at least one functional moiety capable of increasing refractive index of the antireflective coating composition to a value equal or greater than 1.85 at exposure radiation used for imaging the photoresist and at least one functional moiety capable of absorbing exposure radiation used for imaging the photoresist, and further where the functional moiety capable of increasing the refractive index is —(S)n—where n is an integer.
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A spin-on antireflective coating composition for a photoresist comprising a polymer, and a thermal acid generator, where the polymer comprises at least one functional moiety capable of increasing refractive index of the antireflective coating composition to a value equal or greater than 1.85 at exposure radiation used for imaging the photoresist and at least one functional moiety capable of absorbing exposure radiation used for imaging the photoresist and further where the functional moiety capable of increasing the refractive index is selected from a halide.
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Dependencies are inferred from the claim text.