US 2008/0073577 A1 · Substrate holding apparatus

Abstract

This invention relates to a substrate holding apparatus for use in ion implanters. In particular, the present invention relates to a substrate holding system comprising two or more substrate holders that can adopt interchangeable positions, thereby allowing one substrate holder to scan a substrate through an ion beam while substrates can be swapped on the other substrate holder. The substrate holder assembly comprises a base rotatable about a first axis and at least two support arms extending from the base to ends provided with substrate holders. Rotating the base allows the substrate holders to move between designated positions. One designated position may correspond to a position for implanting a substrate and another designated position may correspond to a loading/unloading station.

Claims13

Dependent claims

A substrate holder assembly for holding substrates to be exposed to an ion beam during implantation in an ion implanter, the substrate holder assembly comprising:

a base rotatable about a first axis;
at least two support arms extending from the base to ends provided with substrate holders;
wherein rotation of the base allows the substrate holders to adopt designated positions, with the at least two support arms extending from points displaced from the axis of rotation by substantially equal distances and separated by a substantially equal separation angle such that rotation of the base through the separation angle causes the support arms to move between designated positions.

Dependencies are inferred from the claim text.

Facts

Application

11/527,724Filed 27 Sep 2006

Published

27 Mar 2008

Term ends

Not estimatedThe source records don’t support an estimate.

Classification4 codes

H10P 72/0471
Comprising a chamber adapted to a particular process: comprising at least one ion or electron beam chamber
H10P 72/7602
Using mechanical means, e.g. clamps or pinches: the wafers being placed on a robot blade or gripped by a gripper for conveyance
H10P 72/7618
The wafers being placed on a susceptor, stage or support: characterised by a movable susceptor, stage or support, others than those only rotating…
H10P
Generic processes or apparatus for the manufacture or treatment of devices covered

Substrate holding apparatus

Life of this patent

Substrate holding apparatus

Life of this patent

Abstract

Claims13