Apparatus for cleaning exhaust part and vacuum pump of reaction chamber for semiconductor device and LCD manufacturing equipment

An apparatus for cleaning exhaust parts and vacuum pumps of plural reaction chambers, comprising:

• a plurality of plasma chambers into which a fluorine or chlorine gas is induced from a gas supply unit as a source of fluorine or chlorine radicals used for removing solid deposits accumulated in the exhaust part and vacuum pump by reaction gas for a process performed in each of the reaction chambers;
• and
• a plasma source supply mechanism to convert the fluorine or chlorine gas into the fluorine or chlorine radicals through application of plasma power to the fluorine or chlorine gas induced into each of the plasma chambers, the plasma source supply mechanism comprising an RF generator, a plurality of antennas, each surrounding a corresponding plasma chamber to convert the fluorine or chlorine gas into the fluorine or chlorine radicals within each of the plasma chambers after receiving RF power supplied from the RF generator, a relay switch for selection of RF supply to connect the RF generator with each of the plasma chambers, and a controller to control the RF power generated by the RF generator,
• wherein the radicals converted by the plasma source supply mechanism are supplied to each of the exhaust pipes, and serve to remove the solid deposits accumulated therein.