Apparatus and method for reflowing photoresist

Abstract

A method of and an apparatus for reflowing photoresist ensure that the photoresist is heated uniformly when it reaches a desired temperature at which the photoresist is to reflow. The photoresist reflowing apparatus includes a chamber, a plate disposed within the chamber and on which a substrate having a photoresist pattern thereon is to be supported, a motor coupled with the plate to rotate the plate, and a microwave source which emits a beam of microwaves with directionality. The microwave source is oriented to irradiate the substrate such that the beam of microwaves is located between the center of the substrate and the outer peripheral edge of the substrate. The temperatures of the photoresist pattern may be detected at local regions on the substrate. In this case, the speed of rotation of the substrate is adjusted if at least one of the temperatures of the photoresist pattern at a local region of the substrate is not within the allowable range.

Dependencies are inferred from the claim text.