Method for producing conductor arrays on semiconductor devices
OwnerTorsten Mueller, Josef Willer +1inventors
InventorsTorsten Mueller, Josef Willer, Stephanie Iacono
Life of this patent
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Abstract
A periodic pattern of conductor tracks with broader interspaces is produced by the application of a totally periodic pattern and subsequent removal of individual conductor tracks. An alternative method comprises the formation of a completely periodic hardmask, from which individual parts are removed. The modified hardmask is then used to etch a periodic pattern of conductor tracks with intermediate broader spaces.
Claims28
A method of producing conductor arrays on semiconductor devices, the method comprising:
- providing a substrate having a main surface;
- forming an array of conductor tracks in a periodic pattern over the main surface;
- forming a mask over the conductor tracks, the mask leaving uncovered a plurality of said conductor tracks of the group consisting of:
- a) a plurality of single ones of said conductor tracks, these single conductor tracks being separated from one another by covered ones of said conductor tracks;
- b) a plurality of groups of at least two neighboring ones of said conductor tracks, these groups being separated from one another by covered ones of said conductor tracks;
- and
- c) a plurality of single ones of said conductor tracks and groups of at least two neighboring ones of said conductor tracks, these single conductor tracks and groups being separated from one another by covered ones of said conductor tracks;
- removing the conductor tracks that are not covered by said mask;
- and
- removing said mask.
A method of producing conductor arrays on semiconductor devices, the method comprising:
- providing a substrate having a main surface;
- forming an array of periodically arranged parallel conductor tracks on said main surface;
- and
- removing at least one of said conductor tracks while leaving neighboring ones of said at least one conductor track.
A method of producing conductor arrays on semiconductor devices, the method comprising:
- providing a substrate having a main surface;
- forming an array of periodically arranged parallel conductor tracks on said main surface;
- and
- removing at least a group of neighboring ones of said conductor tracks while conductor tracks that are next to said group remain.
A method of producing conductor arrays on semiconductor devices, the method comprising:
- providing a semiconductor chip with a periodic pattern of conductor tracks;
- and
- removing isolated ones of said conductor tracks to interrupt the periodic pattern by interspaces.
A method of producing conductor arrays on semiconductor devices, the method comprising:
- providing a semiconductor chip with a periodic pattern of conductor tracks;
- and
- removing groups of said conductor tracks, said groups being separated by further ones of said conductor tracks, to interrupt the periodic pattern by interspaces.
A method of producing conductor arrays on semiconductor devices, the method comprising:
- providing a semiconductor chip with a main surface;
- forming at least one layer of electrically conductive material on said main surface;
- forming a hardmask onto said layer;
- structuring said hardmask periodically according to a periodic pattern of conductor tracks;
- removing at least one isolated part of the structured hardmask, thus interrupting the periodic pattern;
- removing portions of said layer of electrically conductive material that are not covered by the hardmask, thus forming an array of conductor tracks in an interrupted periodic pattern;
- and
- removing the hardmask.
A method of producing conductor arrays on semiconductor devices, the method comprising:
- providing a semiconductor chip with a main surface;
- forming at least one layer of electrically conductive material on said main surface;
- forming a first mask onto said layer;
- structuring said first mask periodically according to a periodic pattern of conductor tracks;
- forming a second mask onto said first mask;
- removing portions of said first mask by means of said second mask, thus interrupting the periodic pattern;
- removing said second mask;
- removing portions of said layer of electrically conductive material in alignment with the first mask, thus forming an array of conductor tracks in an interrupted periodic pattern;
- and
- removing said first mask.
Dependencies are inferred from the claim text.