Liquid immersion lithography system with tilted liquid flow
AssigneeASML Holding N.V.
InventorsAleksandr Khmelichek, Louis Markoya, Harry Sewell
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Abstract
A liquid immersion lithography system including a projection optical system for directing electromagnetic radiation onto a substrate, and a showerhead for delivering liquid flow between the projection optical system and the substrate. The showerhead includes an injection nozzle and a retrieval nozzle located at different heights. The liquid flow is tilted relative to the substrate. A direction from the injection nozzle to the retrieval nozzle is tilted at approximately 1 to 2 degrees relative to the substrate.
Claims8
A liquid immersion lithography system, comprising:
- a projection optical system to direct electromagnetic radiation onto a substrate;
- and
- a showerhead to deliver liquid flow between the projection optical system and the substrate,
- wherein the showerhead includes an injection nozzle and a retrieval nozzle located at different heights.
A liquid immersion lithography system comprising:
- a projection optical system to expose a substrate;
- and
- an injection nozzle and a retrieval nozzle to deliver tilted liquid flow between the projection optical system and the substrate.
An exposure system comprising:
- in order of light propagation, an illumination source, a condenser lens, a contrast device and projection optics;
- a liquid delivery system to provide liquid to an exposure area below the projection optics;
- and
- means for providing tilted liquid flow of the liquid.
An exposure system comprising:
- in order of light propagation, an illumination source, a condenser lens, a contrast device and projection optics;
- a liquid delivery system to provide liquid to an exposure area of a substrate;
- and
- means for tilting the substrate relative to a horizontal.
Dependencies are inferred from the claim text.