Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsMarcel Beckers, Sjoerd Donders, Christiaan Hoogendam, Johannes Jacobs, Nicolaas Kate, Nicolaas Kemper, Ferdy Migchelbrink, Elmar Evers
Life of this patent
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Abstract
A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
Claims52
A lithographic apparatus, comprising:
- a substrate table constructed to hold a substrate;
- a projection system configured to project a patterned radiation beam onto a target portion of the substrate;
- and
- a barrier member having a surface surrounding a space between a final element of the projection system and the substrate table, the barrier member being configured to contain a liquid in the space between the final element and the substrate, the barrier member comprising a liquid inlet configured to provide liquid to the space and a liquid outlet configured to remove liquid from the space, wherein the liquid inlet and/or the liquid outlet extends around a fraction of the inner circumference of the surface.
A lithographic apparatus, comprising:
- a substrate table constructed to hold a substrate;
- a projection system configured to project a patterned radiation beam onto a target portion of the substrate;
- and
- a barrier member having a surface surrounding a space between a final element of the projection system and the substrate table, the barrier member being configured to contain a liquid in the space between the final element and the substrate, the barrier member comprising a liquid inlet configured to provide liquid to the space, the inlet comprising a chamber in the barrier member separated from the space by a plate member, the plate member forming at least part of the surface and having a plurality of through holes extending between the chamber and the space for the flow of liquid therethrough.
A lithographic apparatus, comprising:
- a substrate table constructed to hold a substrate;
- a projection system configured to project a patterned radiation beam onto a target portion of the substrate;
- a liquid supply system configured to supply liquid to a space between a final element of the projection system and a substrate;
- and
- a control system configured to dynamically vary the rate of extraction of liquid by the liquid supply system from the space and/or dynamically vary the rate of supply of liquid by the liquid supply system such that a level of liquid in the space is maintained between a predetermined minimum and a predetermined maximum.
A lithographic apparatus, comprising:
- a substrate table constructed to hold a substrate;
- a projection system configured to project a patterned radiation beam onto a target portion of the substrate;
- and
- a liquid supply system configured to provide liquid to a space between a final element of the projection system and a substrate, wherein the liquid supply system comprises an extractor configured to remove liquid from the space, the extractor comprising a two dimensional array of orifices through which the liquid can be extracted from the space.
A device manufacturing method, comprising;
- projecting a patterned beam of radiation onto a substrate using a projection system, wherein a barrier member has a surface which surrounds a space between a final element of the projection system which projects the patterned beam and the substrate, the barrier member being configured to contain a liquid in the space between the final element and the substrate;
- providing liquid to the space through a liquid inlet;
- and
- removing liquid from the space via a liquid outlet, wherein the liquid inlet and/or the liquid outlet extends around a fraction of the inner circumference of the surface.
A device manufacturing method comprising, projecting a patterned beam of radiation onto a substrate using a projection system, wherein a liquid is provided between a final element of the projection system and the substrate, the liquid being contained by a barrier member having a surface, the liquid being provided to the space through an inlet which comprises a chamber in the barrier member separated from the space by a plate member and the plate member having a plurality of through holes extending between the chamber and the space through which the liquid flows.
A device manufacturing method, comprising;
- projecting a patterned beam of radiation onto a substrate using a projection system, wherein liquid is provided to a space between the final element of a projection system and the substrate and a rate of extraction of liquid from the space is dynamically varied and/or the rate of supply of liquid to the space is dynamically varied to maintain the level of liquid in the space between a predetermined minimum and a predetermined maximum.
A device manufacturing method, comprising:
- projecting a patterned beam of radiation onto a substrate using a projection system, wherein liquid is provided to a space between a final element of a projection system and a substrate and liquid being extracted from the space through an extractor which comprises a two dimensional array of orifices.
Dependencies are inferred from the claim text.