Method for cleaning heat treatment apparatus
OwnerKazuhide Hasebe, Mitsuhiro Okada +2inventors
InventorsKazuhide Hasebe, Mitsuhiro Okada, Takashi Chiba, Jun Ogawa
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Abstract
The present invention is a method of cleaning a heat treatment apparatus that deposits an SiO2 film by mean of TEOS on an object to be processed contained in a treatment vessel capable of forming a vacuum. In the cleaning method, the heat treatment apparatus is cleaned by supplying an HF gas and an NH3 gas into the treatment vessel.
Claims7
A method of cleaning a heat treatment apparatus that deposits an SiO2 film by means of TEOS on an object to be processed contained in a treatment vessel capable of forming a vacuum, the method comprising the step of:
- cleaning the heat treatment apparatus by supplying an HF gas and an NH3 gas into the treatment vessel.
A method of cleaning a heat treatment apparatus that deposits an AsSG film by means of TEOS on an object to be processed contained in a treatment vessel capable of forming a vacuum, the method comprising the step of:
- cleaning the heat treatment apparatus by supplying an HF gas and an NH3 gas into the treatment vessel.
A method of cleaning a heat treatment apparatus that deposits a BSG film by means of TEOS on an object to be processed contained in a treatment vessel capable of forming a vacuum, the method comprising the step of:
- cleaning the heat treatment apparatus by supplying an HF gas and an NH3 gas into the treatment vessel.
Dependencies are inferred from the claim text.