Chemical and mechanical polishing method and polishing liquid using therefor

Abstract

A polishing method comprising chemically and mechanically polishing a surface to be polished, the polishing comprising a plurality of steps, wherein the surface is polished with a polishing liquid containing an oxidant in each of the plurality of steps, and the polishing liquids used for the each of the steps are different only in a concentration of the oxidant and satisfy the following expression (1): Rn-1>Rn (1), wherein Rn represents a polishing rate of the surface to be polished in nth step, Rn-1 represents a polishing rate of the surface to be polished in n−1th step, and n represents an integer of 2 or more.

Dependencies are inferred from the claim text.