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US 2006/0189171 A1Published application
Seasoning process for a deposition chamber
OwnerChoon Chua, Lee Kang +1inventors
InventorsChoon Chua, Lee Kang, Chee Foo
Life of this patent
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Abstract
A seasoning process for a deposition chamber, the process comprising providing a silicon-containing seasoning gas inside the deposition chamber; and forming a silicon-based seasoning film on at least one surface inside the deposition chamber, the seasoning film having a refractive index of about 1.48 or more.
Claims16
A seasoning process for a deposition chamber, the process comprising:
- providing a silicon-containing seasoning gas inside the deposition chamber;
- and
- forming a silicon-based seasoning film on at least one surface inside the deposition chamber, the seasoning film having a refractive index of about 1.48 or more.
A method of processing a wafer in deposition chamber, the method comprising
- providing a silicon based seasoning film on at least one surface inside the deposition chamber, the seasoning film having a refractive index of about 1.48 or more;
- and
- gettering metallic contamination atoms during processing of the wafer in the deposition chamber utilising the seasoning film.
Dependencies are inferred from the claim text.