Merging sub-resolution assist features of a photolithographic mask
AssigneeTexas Instruments Incorporated
InventorsSean O'Brien, Guohong Zhang
Life of this patent
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AssigneeTexas Instruments Incorporated
InventorsSean O'Brien, Guohong Zhang
Estimating the term…
Merging sub-resolution assist features includes receiving a mask pattern that includes the sub-resolution assist features. A first sub-resolution assist feature is selected to merge with a second sub-resolution assist feature. A merge bar width of a merge bar is established. A distance between the first sub-resolution assist feature and the second sub-resolution assist feature is determined. A merging technique is determined in accordance with the distance and the merge bar width. The first sub-resolution assist feature and the second sub-resolution assist feature are merged according to the identified merging technique.
A method for merging a plurality of sub-resolution assist features, comprising:
Software for merging a plurality of sub-resolution assist features, the software embodied in a medium and operable to:
A system for merging a plurality of sub-resolution assist features, comprising:
A method for merging a plurality of sub-resolution assist features, comprising:
A method for merging a plurality of sub-resolution assist features, comprising:
Software for merging a plurality of sub-resolution assist features, the software embodied in a medium and operable to:
A system for merging a plurality of sub-resolution assist features, comprising:
A method for merging a plurality of sub-resolution assist features, comprising:
Dependencies are inferred from the claim text.