Method and apparatus for vacuum deposition

An apparatus for vacuum deposition, comprising:

• a vacuum chamber;
• evacuating means for evacuating an inside of said vacuum chamber;
• one or more crucibles for resistance heating, said crucible containing at least one film-depositing material;
• a power source for resistance heating which supplies said one more crucibles with resistance heating power;
• temperature measuring means for measuring temperature in an interior of said one crucible or at least one crucible among said more crucibles;
• and
• control means for controlling supply of power from said power source for resistance heating to said one or more crucibles in accordance with a measurement result of the temperature of said interior of said one crucible or said at least one crucible with said temperature measuring means,
• wherein heating of said one or more crucibles is controlled by said control means and a film is formed on a surface of a substrate under controlling of heating of said one or more crucibles.