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US 2006/0075688 A1Published application
Polishing composition and method of polishing with the same
AssigneeFuji Photo Film Co., Ltd.
InventorKenji Takenouchi
Life of this patent
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Abstract
A polishing composition comprises: at least one compound selected from tetrazole compounds and derivatives thereof and anthranilic acid compounds and derivatives thereof; abrasive particles comprising associative abrasive particles; and an oxidizing agent.
Claims11
A polishing composition comprising:
- at least one compound selected from tetrazole compounds and derivatives thereof and anthranilic acid compounds and derivatives thereof;
- abrasive particles comprising_associative abrasive particles;
- and
- an oxidizing agent.
1 more element
Dependencies are inferred from the claim text.