Coating compositions for use with an overcoated photoresist
AssigneeRohm and Haas Electronic Materials LLC
InventorsSuzanne Coley, Peter Trefonas, Patricia Fallon, Gerald Wayton
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Abstract
Compositions and methods are provided that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred coating composition and methods of the invention can provide enhanced resolution of a patterned overcoated photoresist layer and include use of low activation temperature thermal acid generators as well as multiple thermal treatments to process a layer of the underlying coating composition.
Claims10
A coated substrate comprising:
- an underlying organic composition layer comprising a resin and an ionic thermal acid generator compound that comprises a cation component that has a molecular weight of less than 100;
- and
- a photoresist layer over the organic composition layer.
A coated substrate comprising:
- an underlying organic composition layer comprising a resin and a thermal acid generator compound that produces acid upon heating at 150° C. for 30 seconds or less;
- and
- a photoresist layer over the organic composition layer.
A method for processing a substrate, comprising:
- applying a liquid coating layer of an organic composition on a substrate surface;
- first heating the applied composition coating layer to remove organic solvent;
- after the first heating, heating the application composition coating layer to harden the coating layer,
- applying a photoresist layer over the hardened composition coating layer,
- wherein the maximum temperature of the first heating is at least about 20° C. lower than the maximum temperature of the heating to harden the composition coating layer.
A method for processing a substrate, comprising:
- applying a coating layer of an organic composition on a substrate surface, the organic composition comprising a resin and an ionic thermal acid generator compound that comprises a cation component that has a molecular weight of less than 100;
- applying a photoresist layer over the organic composition coating layer.
A method for processing a substrate, comprising:
- applying a coating layer of an organic composition on a substrate surface, the organic composition comprising a resin and a thermal acid generator compound that produces acid upon heating at 150° C. for 30 seconds or less;
- applying a photoresist layer over the organic composition coating layer.
An organic antireflective coating composition comprising:
- a resin and a thermal acid generator compound that and an ionic thermal acid generator compound that comprises a cation component that has a molecular weight of less than 100.
An organic antireflective coating composition comprising:
- a resin and a thermal acid generator compound that produces acid upon heating at 150° C. for 30 seconds or less.
Dependencies are inferred from the claim text.