Method for aligning exposure mask and method for manufacturing thin film device substrate

Abstract

A method for aligning an exposure mask, comprises :using a plurality of hologram masks, on which alignment marks are formed,; aligning position of the hologram masks toward an object, which is exposed and on which alignment marks are also formed, a plurality of times by using both alignment marks, wherein a first straight line connects a first area on the object to be exposed for a pattern exposure with the alignment mark for aligning with a holographic mask that is used in an exposure onto the first area and a second straight line connects the other area, adjacent to the first area, on the object to be exposed for a pattern exposure with the other alignment mark for aligning with a holographic mask that is used in an exposure onto the another area, and the first straight line and the second straight line are intersected each other.

Dependencies are inferred from the claim text.