Alignment system, alignment method, and lithographic apparatus

An alignment system configured to align two devices with respect to each other in at least two directions, the alignment system comprising:

• a proximity switch,
• a control system operatively connected to said proximity switch and configured to receive a detection state of said proximity switch, and
• at least one actuator operatively connected to said control system and configured to move a first of said two devices relative to a second of said two devices,
• wherein the alignment system is configured to determine a position of said first device relative to the second of said two devices in at least two directions.

A method for aligning two devices with respect to each other in at least two directions, a first of said two devices being provided with a proximity switch, the method comprising:

• detecting an edge or an outer surface of a second of said two devices using said proximity switch;
• determining a position of said edge or said outer surface with respect to said proximity switch based on said detecting;
• and
• determining a position of the second of said two devices with respect to said proximity switch from the position of said edge or said outer surface.