Lithographic apparatus and device manufacturing method

A device manufacturing method, comprising:

• confining liquid to a space between a projection system of a lithographic projection apparatus and a substrate using a liquid confinement structure of the lithographic projection apparatus, the confinement structure having a buffer surface positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance;
• providing liquid in a recess in the buffer surface to enable rapid filling of a gap between the substrate and the substrate table as the gap moves under the buffer surface;
• and
• projecting a patterned beam of radiation, using the projection system, through liquid in the space onto the substrate.

A lithographic projection apparatus, comprising:

• an illumination system configured to condition a beam of radiation;
• a support structure constructed to hold a patterning device, the patterning device configured to impart the beam of radiation with a pattern;
• a substrate table constructed to hold a substrate;
• a projection system configured to project the patterned beam of radiation onto the substrate;
• and
• a liquid confinement structure configured to at least partly confine a liquid to a space between the projection system and the substrate, wherein the confinement structure has a buffer surface positioned, when in use, in close proximity to a plane substantially comprising the upper surface of the substrate and of the substrate table, to define a passage having a flow resistance, the buffer surface comprising a recess, said recess when in use, being normally full of liquid to enable rapid filling of a gap between the substrate and the substrate table as the gap moves under the buffer surface.