Exposure apparatus, and device manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorToshiyuki Shigaraki
Life of this patent
Estimating the term…
Abstract
Disclosed is an apparatus for exposing a wafer to light, the apparatus including a light source unit having a light source for emitting light, a first cooling unit for cooling the light source unit, the first cooling unit having a gas flowpassage for a gas passing through the light source unit, and a second cooling unit for cooling the gas, the second cooling unit having a first fluid flowpassage for a first fluid which is to be heat-exchanged with the gas in the gas flowpassage at a position downstream of the light source unit with respect to the flow of the gas.
Claims6
An apparatus for exposing a wafer to light, said apparatus comprising:
- a light source unit having a light source for emitting light;
- a first cooling unit for cooling said light source unit, said first cooling unit having a gas flowpassage for a gas passing through said light source unit;
- and
- a second cooling unit for cooling the gas, said second cooling unit having a first fluid flowpassage for a first fluid which is to be heat-exchanged with the gas in the gas flowpassage at a position downstream of said light source unit with respect to the flow of the gas.
Dependencies are inferred from the claim text.