Apparatus and method of exposing a semiconductor device having a curved surface to light

A method of exposing light on a surface area of an object having a curvature, comprising:

• passing light according to a pattern of a mask;
• directing the light passed by the pattern of the mask though a lens to the surface area of the object;
• and
• altering a focal distance between the lens and the object to expose the light passed by the pattern of the mask on surface areas of the object.

An optical apparatus for exposing light on a surface area of an object having a curvature, comprising:

• first and second optical stations each including,
• (a) a mask adapted for receiving light and passing the light to the object in accordance with a pattern of the mask, and
• (b) a lens positioned at a focal distance between the mask and the object,
• wherein the object passes in proximity to the first optical station to expose the light passed by the mask of the first optical station on a first surface area of the object and the object passes in proximity to the second optical station to expose the light passed by the mask of the second optical station on a second surface area of the object.

A method of manufacturing a semiconductor device, comprising:

• passing light according to a pattern of a mask;
• directing the light passed by the pattern of the mask though a lens to the surface area of the semiconductor device;
• and
• altering a focal distance between the lens and the semiconductor device to expose the light passed by the pattern of the mask on surface areas of the semiconductor device.