Method of forming an integrated optical circuit
AssigneeInfinera Corporation
InventorsBrent Little, John Hryniewicz, David Gill, Roy Davidson, Philippe Absil
Life of this patent
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AssigneeInfinera Corporation
InventorsBrent Little, John Hryniewicz, David Gill, Roy Davidson, Philippe Absil
Estimating the term…
A method for forming an optical circuit on a substrate. The method comprising a plurality of mask images to define the optical circuit image in photoresist. Each of the mask images defining parts of the optical circuit and the totality of all mask images substantially defining all of the optical circuit. A photolithography system globally aligns and exposes the mask images in photoresist. The resultant composite image being substantially indistinguishable from a single image of the entire optical circuit. Different images for each of the parts can be substituted by other images, thereby exponentially increasing the number of circuit permutations from a predetermined number of images. The method is also applicable to generating a unique circuit from a pre-existing library of reticle images. The images are printed in predetermined locations on a substrate to define the desired optical circuit.
A method for forming an integrated optical circuit comprising:
A method for forming an integrated optical circuit from a set of mask images comprising:
Dependencies are inferred from the claim text.