Patterning apparatuses and methods for the same
AssigneeMicronic Laser Systems AB
InventorTorbjorn Sandstrom
Life of this patent
Estimating the term…
Abstract
An apparatus for patterning a workpiece may include at least two spatial light modulators. The at least two spatial light modulators may receive and relay electromagnetic radiation from an electromagnetic radiation source toward a workpiece. The electromagnetic radiation may be split into at least two beams in an optical plane between the at least two spatial light modulators and at least one of an illuminator pupil and a conjugate optical plane. Each of the at least two spatial light modulators may receive a corresponding one of the at least two beams.
Claims36
An apparatus for patterning a workpiece comprising:
- at least two spatial light modulators adapted to receive electromagnetic radiation from an electromagnetic radiation source, and relay the electromagnetic radiation toward the workpiece, the electromagnetic radiation being split into at least two beams in an optical plane between the at least two spatial light modulators and at least one of an illuminator pupil and a conjugate optical plane, and each of the at least two spatial light modulators receiving a respective one of the at least two beams.
A method for patterning a workpiece, the method comprising:
- splitting the electromagnetic radiation into at least two beams in an optical plane between an object plane and at least one of an illuminator pupil and another conjugate optical plane;
- impinging each of the at least two beams on a corresponding one of at least two spatial light modulators;
- patterning the workpiece by directing the electromagnetic radiation from the at least two spatial light modulators toward the workpiece.
Dependencies are inferred from the claim text.