Method and system for lattice space engineering
AssigneeSilicon Genesis Corporation
InventorsFrancois Henley, Philip Ong, Igor Malik
Life of this patent
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Abstract
A system for manufacturing multilayered substrates. The system has a support member is adapted to process a film of material comprising a first side and a second side from a first state to a second state. The support member is attached to the first side of the film of material. The second state comprises a stressed state. The system has a handle substrate comprising a face, which is adapted to be attached to the second side of the film of material. The support member is capable of being detached from the first side of the film of material thereby leaving the handle substrate comprising the film of material in the second state being attached to the face of the handle substrate.
Claims52
A method for fabricating multi-layered substrates, the method comprising:
- providing a donor substrate comprising an overlying film of transfer material, the film of transfer material being characterized in a first state and having a face region;
- coupling the film of transfer material to a support member;
- attaching the face region of the film of transfer material to the support member;
- removing the donor substrate from the film of material to expose a backside region and free the film of transfer material from the donor substrate while the film of transfer material remains affixed to the support member;
- processing the film of material using the support member from the first state to a second state, the second state being characterized as a stressed state;
- attaching the backside region of the film of material in the second state, while being affixed to the support member, to a handle substrate;
- and
- releasing the support member from the film of transfer material to provide the handle substrate with an overlying film of transfer material.
A method for fabricating multi-layered substrates, the method comprising:
- providing a donor substrate comprising an overlying film of material, the film of material being characterized in a relaxed state, the film of material having a face region;
- coupling the film of material to a support member;
- attaching the face region of the film of material to the support member;
- releasing the donor substrate from the film of material to expose a backside region and free the film of material from the donor substrate while the film of material remains affixed to the support member;
- expanding the film of material using the support member from the first state that is characterized by the relaxed state to a second state, the second state being characterized as a stressed state;
- attaching the backside region of the film of material in the second state, while being affixed to the support member, to a handle substrate;
- and
- releasing the support member from the film of transfer material in the second state;
- providing the handle substrate comprising the film of material in the stressed state;
- and
- processing one or more regions on the film of material in the stressed state.
A system for manufacturing multilayered substrates, the system comprising:
- a support member being adapted to process a film of material, comprising a first side and a second side, from a first state to a second state, the support member being attached to the first side of the film of material, whereupon the second state comprises a stressed state;
- a handle substrate comprising a face, the face being adapted to be attached to the second side of the film of material;
- whereupon the support member is capable of being detached from the first side of the film of material thereby leaving the handle substrate comprising the film of material in the second state being attached to the face of the handle substrate.
A method for fabricating multi-layered substrates, the method comprising:
- providing a donor substrate comprising a thickness of a film of transfer material, the film of transfer material being characterized in a first state and having a face region;
- temporarily affixing the face region of the film of transfer material to a support member;
- removing the donor substrate from the film of material to expose a backside region and free the film of transfer material from the donor substrate while the face region of the film of transfer material remains temporarily affixed to the support member;
- processing the film of material using the support member from the first state to a second state, the second state being characterized as a stressed state;
- attaching the backside region of the film of material in the second state, while being affixed to the support member, to a handle substrate;
- and
- releasing the support member from the film of transfer material to provide the handle substrate with an overlying film of transfer material.
A cluster tool system for forming strained substrates, the system comprising:
- a handling chamber coupled to a robot arm;
- a strain developing chamber coupled to the robot arm, the strain developing chamber comprising a strain developing substrate, the strain developing substrate being adapted to form strain in a thickness of material using the strain developing substrate coupled to the thickness of material.
Dependencies are inferred from the claim text.